MULTI-LEVEL SYSTEMS OF INTERCIRCUIT CONNECTION



 

 

 

 

 

 

PURPOSE

Multi-level systems of intercircuit connection can serve as a basis or substrate for a wide range of electronic devices with an increased mechanical resistance, heat radiation and high resistance against electromagnetic radiations

 

TECHNICAL CHARACTERISTICS

Min. width of conductors and leads between them, µm                                                                  8...10
Electric reliability of insulating coating, V/cm 0,01
Range of operating temperatures, К 50...100
Dielectric loss tangent 1012
Thermal conductivity, W/m·К 2·105
Thickness of insulating coating,  µm 10...2·105
Thickness of free oxide film,  µm 200...750


ADVANTAGES

  • planarity of surface relief
  • high integration level 
  • reproducibility and high accuracy of geometrical topology sizes 
  • high dissipation power 
  • possibility to embed passive resistance and capacitor elements into metal coating
  • high durability under mechanical, thermal and electromagnetic actions 
  • reproducibility of electrical parameters 
  • widened possibilities of topological layout design  

 

DEVELOPER

R&D LAB 4.2 «Hybrid IC technology»

 

CONTACTS

6, P.Brovki str., 220013, Minsk, Republic of Belarus
☏  +375 17 293 88 50, +375 17 293 21 19
🖷  +375 17 292 96 28
🖂   sokol@bsuir.by

 

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NANOTECHNOLOGIES

MICROELECTRONICS