ION SOURCES

Sputtering ion source based on accelerator with anodic layer SPIS-002

Ion beam assisted source based on accelerator with anodic layer ASIS-002

Double-beam ion source based on accelerator with anodic layer DBIS-001

Ion source based on end-Hall accelerator EHIS-002

Ion source based on end-Hall accelerator of EHPM series

Ion source based on end-Hall accelerator with integrated plasma electron source 

Ion assisted source with double Hall-current

Ion assisted source with combined anodic layer

Ion assisted extended source 

Extended ion assisted / sputtering source with rotatory target

 

PLASMA ELECTRON SOURCE FOR ION BEAM NEUTRALIZATION

Filament-free neutralizer of ion beam NEO-001

 

"COLD" PLASMA GENERATION SYSTEMS

Atmospheric discharge plasma generation system.

High density inductively coupled plasma flat source.

Device for generation and control of cold atmospheric plasma
 

MAGNETRON SPUTTERING SYSTEMS

Magnetron sputtering systems of MARS-100 series

RF/DC magnetron sputtering system МIRAGE-010.080

RF/DC magnetron sputtering system RIF-001.036

Extended magnetron sputtering systems of MSPR-1000 series

Unbalanced magnetron sputtering system MAC-80

 

SYSTEM FOR DIAGNOSTIC PARAMETERS

System for diagnostics of ion beams and charged particle fluxes parameters DENI-1500/001

Quartz sensor QI-001

Charged particles current density measurement sensor CP-002

 

"DEPOSITION" SOFTWARE SYSTEM