PLASMA TECHNOLOGY
ION SOURCES
Sputtering ion source based on accelerator with anodic layer SPIS-002
Ion beam assisted source based on accelerator with anodic layer ASIS-002
Double-beam ion source based on accelerator with anodic layer DBIS-001
Ion source based on end-Hall accelerator EHIS-002
Ion source based on end-Hall accelerator of EHPM series
Ion source based on end-Hall accelerator with integrated plasma electron source
Ion assisted source with double Hall-current
Ion assisted source with combined anodic layer
Extended ion assisted / sputtering source with rotatory target
PLASMA ELECTRON SOURCE FOR ION BEAM NEUTRALIZATION
Filament-free neutralizer of ion beam NEO-001
"COLD" PLASMA GENERATION SYSTEMS
Atmospheric discharge plasma generation system.
High density inductively coupled plasma flat source.
MAGNETRON SPUTTERING SYSTEMS
Magnetron sputtering systems of MARS-100 series
RF/DC magnetron sputtering system МIRAGE-010.080
RF/DC magnetron sputtering system RIF-001.036
Extended magnetron sputtering systems of MSPR-1000 series
Unbalanced magnetron sputtering system MAC-80
SYSTEM FOR DIAGNOSTIC PARAMETERS
System for diagnostics of ion beams and charged particle fluxes parameters DENI-1500/001
Charged particles current density measurement sensor CP-002
CONTACTS
6, P.Brovki str., Minsk, 220013, Republic of Belarus
☏ +375 17 293 80 79, +375 17 293 88 35
🖷 +375 17 293 88 35
🖂 golosov@bsuir.by ; szavad@bsuir.by
🌐 plasma.bsuir.by