PLASMA TECHNOLOGY

ION SOURCES

Sputtering ion source based on accelerator with anodic layer SPIS-002

Ion beam assisted source based on accelerator with anodic layer ASIS-002

Double-beam ion source based on accelerator with anodic layer DBIS-001

Ion source based on end-Hall accelerator EHIS-002

Ion source based on end-Hall accelerator of EHPM series

Ion source based on end-Hall accelerator with integrated plasma electron source 

Ion assisted source with double Hall-current

Ion assisted source with combined anodic layer

Ion assisted extended source 

Extended ion assisted / sputtering source with rotatory target

PLASMA ELECTRON SOURCE FOR ION BEAM NEUTRALIZATION

Filament-free neutralizer of ion beam NEO-001

"COLD" PLASMA GENERATION SYSTEMS

Atmospheric discharge plasma generation system.

High density inductively coupled plasma flat source.

MAGNETRON SPUTTERING SYSTEMS

Magnetron sputtering systems of MARS-100 series

RF/DC magnetron sputtering system МIRAGE-010.080

RF/DC magnetron sputtering system RIF-001.036

Extended magnetron sputtering systems of MSPR-1000 series

Unbalanced magnetron sputtering system MAC-80

SYSTEM FOR DIAGNOSTIC PARAMETERS

System for diagnostics of ion beams and charged particle fluxes parameters DENI-1500/001

Quartz sensor QI-001

Charged particles current density measurement sensor CP-002

"DEPOSITION" SOFTWARE SYSTEM