ION SOURCE BASED ON END-HALL ACCELERATOR OF EHPM SERIES



 

 

 

 

 

 

PURPOSE

Ion source based on end-Hall accelerator of EHPM series is designed for vacuum ion plasma deposition of thin films, ion cleaning, activation of substrate surface, as well as for ion assisted deposition of thin films and direct beam deposition.

 

APPLICATION AREA

  • preliminary ion cleaning and surface activation
  • ion-beam assisted deposition (IBAD) in combination with electron-beam, laser and arc evaporators, as well as ion-beam sputtering systems
  • direct beam deposition (DiBD)

 

TECHNICAL CHARACTERISTICS 

Ion source EHPM-100

Cathode neutralizer                                                                                                     filament or filamentless
Magnetic system Sm-Co permanent magnets
Cooling without cooling
Discharge voltage, V 40...300
Maximal discharge current, A 3,5
Beam divergence > 45º
Ion energy, eV 30...210
Gases Ar, O2, N2, H2, 
hydrocarbons, chlorine and fluorine containing gases
Gas flow, scc/min 2...30
Diameter, mm 94 (3,7 IN)
Height, mm 76 (3,0 IN)
Weight, кg, not more 4


Ion source EHPM-150

Cathode neutralizer                                                                                                     filament or filamentless
Magnetic system Sm-Co permanent magnets
Cooling without cooling or with anode
and magnetic system water cooling
Discharge voltage, V 40...300
Maximal discharge current, A 6,5
Beam divergence > 45º
Ion energy, eV 30...210
Gases Ar, O2, N2, H2, 
hydrocarbons, chlorine and fluorine containing gases
Gas flow, scc/min 6...40
Diameter, mm 145 (5,7 IN)
Height, mm 102 (4,0 IN)
Weight, кg, not more 6


ADVANTAGES 

  • the unique feature of the ion sources is the magnetic system based on permanent magnets. SmCo permanent magnets at high Curie temperature, which are used as a source of magnetic field, have low characteristics drift when heated
  • simplicity of design
  • easy to assemble

 

DEVELOPER

Center 2.1 "Electronic technologies and engineering diagnostics of process media and solid-state structures"

 

CONTACTS

6, P. Brovki str., 220013, Minsk, Republic of Belarus
☏  +375 17 293 80 79, +375 17 293 88 35 
🖷  +375 17 293 88 35
🖂   svad@bsuir.by ; szavad@bsuir.by
🌐  plasma.bsuir.by

 

OTHER INNOVATIONS IN THIS AREA

ION SOURCES

PLASMA ELECTRON SOURCE FOR ION BEAM NEUTRALIZATION

MAGNETRON SPUTTERING SYSTEMS

SYSTEM FOR DIAGNOSTIC PARAMETERS

PROGRAM COMPLEX FOR SIMULATION «DEPOSITION»